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Handbook of Silicon Wafer Cleaning Technology
Posted on 2010-03-16
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More The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. The Handbook reviews the current cleaning technologies, as well as advanced cleaning technologies under investigation for next generation processing, including supercritical fluid, laser, and cryoaerosol cleaning techniques. In addition, the theoretical aspects of the cleaning technologies and how these processes affect the wafer are discussed, including device damage and surface roughening. The analysis of the wafers surface is outlined. Download Links (5 Mb)
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