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Science/Engineering Handbook of VLSI Microlithography

Posted on 2010-03-16




Name:Science/Engineering Handbook of VLSI Microlithography
ASIN/ISBN:0815514441
Language:English
File size:12.5 Mb
Publisher: William Andrew
ISBN: 0815514441
Publish Date: edition 2002
File Type: PDF
Pages: 1001 pages
File Size: 12,5 mb
   Science/Engineering Handbook of VLSI Microlithography

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Handbook of VLSI Microlithography

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.

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