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Technical Handbook of Chemical Vapor Deposition, Second Edition: Principles, Technologies and Applications (Materials Science and Process Technology Series)

Posted on 2010-04-28




Name:Technical Handbook of Chemical Vapor Deposition, Second Edition: Principles, Technologies and Applications (Materials Science and Process Technology Series)
ASIN/ISBN:0815514328
Author:Hugh O. Pierson
Publisher:Noyes Publications (1999)
Pages:Hardcover, 482 pages
File size:3 Mb
   Technical Handbook of Chemical Vapor Deposition, Second Edition: Principles, Technologies and Applications (Materials Science and Process Technology Series)


Author: Hugh O. Pierson


Publisher: Noyes Publications (1999)


Binding: Hardcover, 482 pages


pricer: $180.00


ISBN-10: 0815514328


editorialreviews

Reviews in depth the recent expansion of the number of materials produced by CVD; copper, tungsten, diamond, silicon carbide, silicon nitride, titanium nitride and others. DLC: Chemical vapor deposition.




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