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Science/Engineering SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices

Posted on 2010-03-15




Name:Science/Engineering SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices
ASIN/ISBN:1420066854
Language:English
File size:4 Mb
ISBN: 1420066854
Publish Date: December 13, 2007
Pages: 264 pages
File Type: PDF
Other Info: CRC; 4MB
   Science/Engineering SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices

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John D. Cressler, "SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices"

What seems routine today was not always so. The field of Si-based heterostructures rests solidly on the shoulders of materials scientists and crystal growers, those purveyors of the semiconductor “black arts” associated with the deposition of pristine films of nanoscale dimensionality onto enormous Si wafers with near infinite precision. We can now grow near-defect free, nanoscale films of Si and SiGe strained-layer epitaxy compatible with conventional high-volume silicon integrated circuit manufacturing. SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices tells the materials side of the story and details the many advances in the Si-SiGe strained-layer epitaxy for device applications.

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