Categories
Technical
-- Database/SQL
-- Multimedia
-- Internet/Networking
-- Operating System
-- Programming
-- Security/Hacking
-- Science/Engineering
-- Web/HTML/CSS/Ajax
-- Unix/Linux
-- Windows
-- Mac OS X
-- Office
-- Perl/PHP/Python
-- C/C++/C#
-- .NET
-- Java
-- Hardware
-- Game Development
-- Embedded Systems
-- Graphics and Design
-- Network Programming
Study
Novel
Nonfiction
Health
Tutorial
Entertainment
Business
Magazine
Arts & Design
Audiobooks & Video Training
Cultures & Languages
Family & Home
Law & Politics
Lyrics & Music
Software Related
eBook Torrents
Uncategorized
-- Database/SQL
-- Multimedia
-- Internet/Networking
-- Operating System
-- Programming
-- Security/Hacking
-- Science/Engineering
-- Web/HTML/CSS/Ajax
-- Unix/Linux
-- Windows
-- Mac OS X
-- Office
-- Perl/PHP/Python
-- C/C++/C#
-- .NET
-- Java
-- Hardware
-- Game Development
-- Embedded Systems
-- Graphics and Design
-- Network Programming
Study
Novel
Nonfiction
Health
Tutorial
Entertainment
Business
Magazine
Arts & Design
Audiobooks & Video Training
Cultures & Languages
Family & Home
Law & Politics
Lyrics & Music
Software Related
eBook Torrents
Uncategorized
Share With Friends
Archive by Date
2012-08-06
2012-08-05
2012-08-04
2012-08-03
2012-08-02
2012-08-01
2012-07-31
2012-07-30
2012-07-29
2012-07-28
2012-08-05
2012-08-04
2012-08-03
2012-08-02
2012-08-01
2012-07-31
2012-07-30
2012-07-29
2012-07-28
Search Tag
Neighbours
Necrophagist
csharp
Alpaca
Malassezia
Morphet
Schwarzacher
Smitz
POJOs
方位
Asgard
营销管理
Copp
Snog
accion
Chambre
auxiliary
Tarbuck
Bullinger
Irenaeus
chassins
BAOR
expert
Intimidade
Donny
Metaphysicians
Adipokines
Uploader
arrest
powered
Bernhardt
Bahama
Lizards
Leftovers
Vallarta
Inscannad
shear
Papeles
Liebesdienste
潘多拉
enery
garantiert
phenomenon
Sustained
Trous
Critiques
Impulsna
Kjellberg
投资理财
media
Newest
Science/Engineering Statistical Mechanics, Third Edition
Science/Engineering Essentials of Toxic Chemical Risk: Science and Society
Science/Engineering Telefoncoaching: So machen Sie aus Ihren Mitarbeitern Telefonprofis
Science/Engineering Wireless Communications (Wiley - IEEE)
Science/Engineering Posttraumatische Belastungsstörungen (German Edition)
Science/Engineering Lernplattformen in Schulen: Ansätze für E-Learning und Blended Learning in Präsenzklassen (1 Auflage)
Science/Engineering Stochastik für Einsteiger: Eine Einführung in die faszinierende Welt des Zufalls. Mit über 220 Übungsaufgaben und Lösungen {Repost}
Science/Engineering Testtheorie und Fragebogenkonstruktion (Springer-Lehrbuch)
Science/Engineering Centrifugal Pumps, 2nd Edition
Science/Engineering Computational Intelligence for Modelling and Prediction (Studies in Computational Intelligence) 1 edition {Repost}
Science/Engineering Networks, Crowds, and Markets: Reasoning About a Highly Connected World {repost}
Science/Engineering Introduction to Biophotonics (repost)
Science/Engineering The Art and Science of Psychotherapy (repost)
Science/Engineering Advances in Chemical Physics - Volume 15: Stochastic Processes in Chemical Physics
Science/Engineering "Emulsion Science: Basic Principles" (repost)
Science/Engineering Elementary Principles of Chemical Processes 3rd edition
Science/Engineering Boundary Element Analysis (repost)
Science/Engineering Collection of books on physics 2
Science/Engineering A Practical Handbook of Preparative HPLC by Donald A. Wellings (Repost)
Science/Engineering Reviews of Environmental Contamination and Toxicology 184 by George W. Ware
Science/Engineering Essentials of Toxic Chemical Risk: Science and Society
Science/Engineering Telefoncoaching: So machen Sie aus Ihren Mitarbeitern Telefonprofis
Science/Engineering Wireless Communications (Wiley - IEEE)
Science/Engineering Posttraumatische Belastungsstörungen (German Edition)
Science/Engineering Lernplattformen in Schulen: Ansätze für E-Learning und Blended Learning in Präsenzklassen (1 Auflage)
Science/Engineering Stochastik für Einsteiger: Eine Einführung in die faszinierende Welt des Zufalls. Mit über 220 Übungsaufgaben und Lösungen {Repost}
Science/Engineering Testtheorie und Fragebogenkonstruktion (Springer-Lehrbuch)
Science/Engineering Centrifugal Pumps, 2nd Edition
Science/Engineering Computational Intelligence for Modelling and Prediction (Studies in Computational Intelligence) 1 edition {Repost}
Science/Engineering Networks, Crowds, and Markets: Reasoning About a Highly Connected World {repost}
Science/Engineering Introduction to Biophotonics (repost)
Science/Engineering The Art and Science of Psychotherapy (repost)
Science/Engineering Advances in Chemical Physics - Volume 15: Stochastic Processes in Chemical Physics
Science/Engineering "Emulsion Science: Basic Principles" (repost)
Science/Engineering Elementary Principles of Chemical Processes 3rd edition
Science/Engineering Boundary Element Analysis (repost)
Science/Engineering Collection of books on physics 2
Science/Engineering A Practical Handbook of Preparative HPLC by Donald A. Wellings (Repost)
Science/Engineering Reviews of Environmental Contamination and Toxicology 184 by George W. Ware
Useful Links
Science/Engineering Principles of Plasma Discharges and Materials Processing , 2nd Edition
Posted on 2010-03-15
|
[2007/0922] [2007/0922] [2007/0920] [2007/0906] [2007/0906] By Michael A. Lieberman, Alan J. Lichtenberg Publisher: Wiley-Interscience Number Of Pages: 800 Publication Date: 2005-04-14 Sales Rank: 320086 ISBN / ASIN: 0471720011 EAN: 9780471720010 Binding: Hardcover Manufacturer: Wiley-Interscience Studio: Wiley-Interscience Average Rating: 4 A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever. Download Description: A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever. Review: outstanding plasma resource One of the most practical and comprehensive resources on plasma phyics and engineering. The book is much easier to understand and more in depth than most other books on the subject, except for maybe chen (who takes more of a physics approach, whereas lieberman takes more of an engineering approach) This book is a must have for anyone working with or studying plasmas. Review: Overrated As a praciticing process engineer my opinion is this book lacks insight. Typical text book written a professor in the academic community with no practical experience. This book spends far to much time deriving equations and not discussing the basics concepts. The author makes a half hearted attempt to relate the first 14 chapters to the real worl, in a short and inadequate Chapter 15. This is the first mail book order book i took the time to return. In all honesty this book is not worth the $90.00. Spend your money elsewhere Review: The book provides an excellent overview of plasma processing This book provides an excellent introduction and overview of plasma discharges applied to semiconductor manufacturing. It is well-organized, clearly-written and full of useful examples and exercises. And unlike many books on plasma physics, it is not overly-mathematical and contains many useful physical insights. I strongly recommend this book for anyone wanting to review the field of plasma processing. Review: An excellent overview of common plasma processing devices Lieberman covers many of the standard processing devices and much of the physics needed to model them effectively. The presentation is clear and extremely useful both as a reference and as a tutorial. A must-have book for anyone interested in plasma processing. Review: Very Good Theoretical Coverage of Plasma's, including ECR This book provides a theoretical overview of plasma's, including coverage of ECR applications. This was very valuable for Hitachi Etchers. The theory is presented at an undergraduate level and assumes the reader has knowledge of vector analysis. Highly recommended for any Etch Process Engineer in the Semiconductor Industry.pass: gigapedia.org http://mihd.net/2zuoly http://rapidshare.com/files/62097912/Principles_of_Plasma_Discharges_and_Materials_Processing_0471720011.rar
Rating:
2.5 out of 5 by Book123 |
Download Links | |
Server | Status |
---|---|
No download url, please check the above content. Free download from UseNet >> Can not download? Search other download URLs here >> Buy This Book at Best Price >> |
Like this article?! Give us +1: