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High Density Plasma Sources: Design, Physics and Performance (Materials Science and Process Technology Series)

Posted on 2010-03-16




Name:High Density Plasma Sources: Design, Physics and Performance (Materials Science and Process Technology Series)
ASIN/ISBN:0815513771
Language:English
File size:15.4 Mb
Publisher: William Andrew
Pages: 465 pages
Publish Date: 1997-01-14
ISBN: 0815513771
File Type: PDF
File Size: 15.4 MB
   High Density Plasma Sources: Design, Physics and Performance (Materials Science and Process Technology Series)



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High Density Plasma Sources: Design, Physics and Performance

(Materials Science and Process Technology Series)

By Oleg A. Popov


Product Description:

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications.

This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

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