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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI - ULSI Applications by John E. J. Schmitz
Posted on 2010-07-16
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More This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.
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